In order to promote the research and industrial development of carbon nanomaterials such as graphene in China, the 2016 Graphene Summit Forum will be held at the Shenzhen Graduate School of Tsinghua University on April 14.

This forum will continue to focus on the preparation of graphene-based nanocarbon materials, industrial application and development, etc. Well-known scholars and industry figures from many countries and regions will discuss graphene and other two-dimensional materials from an academic and industrial perspective. The research progress and industrial development status quo will build a platform for communication and cooperation for outstanding scientists and entrepreneurs at home and abroad.
SUNANO GROUP will also attend this forum. As the first drafting unit and team leader unit of my country's first graphene national standard, SUNANO will not only communicate with domestic and foreign experts and scholars, but also introduce the world's most advanced ofMulti-density plasma CVD system-NEXTCVD。If you are engaged in related work, welcome to the scene to communicate with us.
 
Multi-density plasma CVD system-NEXTCVD
SUNANO multifunctional wide-density plasma CVD combines the advantages of inductively coupled and capacitively coupled glow discharge to achieve stable plasma-assisted CVD in a wide density process range (109-1013 cm-3) with excellent material handling performance and Wide range of applications, it is currently the most powerful plasma CVD system in the world.
       main feature
l Mainly used for thinning, etching, modification and modification of graphene surface layers
l Generate stable plasma glow discharge under various working gases:
l Argon, hydrogen, nitrogen, oxygen, silane, borane, phosphine, germane, methane, ammonia, sulfur hexafluoride, carbon tetrafluoride, carbon dioxide, etc.
l The plasma density is adjustable, with a wide range of variation (109-1013 cm-3)
l Can work with magnetron sputtering to form co-deposition (up to four magnetron sputtering targets can form plasma-assisted deposition), so it can deposit a variety of compound films
Wide range of applications

l Photovoltaic industry (silicon nitride/amorphous silicon/microcrystalline silicon/plasma texture and etching)
l New two-dimensional materials (surface modification and preparation of graphene/molybdenum disulfide, etc.)
l Semiconductor process (etching process/silicon nitride and silicon dioxide process, etc.)
l Growth of nanomaterials and etching structure of nanotopography

 
Warmly welcome people from all walks of life from all over the world to visit the booth of Juna Group to communicate and discuss the great cause of cooperation!